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authFullName_s : Benoit Riou

The influence of Al 2 O 3 nanolamination in ALD ZrO 2 capacitor on physical and electrical characteristics

Virgil Guillon , Benoit Riou , Jérôme Billoué , Thomas Defforge , Pascal Gardes et al.
Journal of Applied Physics, 2022, 132 (23), pp.234103. ⟨10.1063/5.0128507⟩
Journal articles hal-03980029v1

Structural and electrical properties of ZrO2/Al2O3/ZrO2 3D MIM capacitor deposited by Atomic Layer Deposition

Virgil Guillon , Jérôme Billoué , Thomas Defforge , Benoit Riou , Gaël Gautier et al.
International Conference on Electronics, Communications and Control Engineering (ICECC 2022), Mar 2022, Fukuoka (virtual event), Japan
Conference papers hal-03980956v1